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AMAT · USPTO Filings

Applied Materials, Inc. — Patent Applications


Recent USPTO patent applications filed under applicant “Applied Materials, Inc. / APPLIED MATERIALS, INC.” — pending requests, not granted patents. Where a filing continues an already-granted parent, the parent’s number is shown.

50
Tracked Applications
33
Continuations of Granted Parents

Recent Applications

Every row is a patent application — a pending request, not a granted patent. “Granted Parent” shows the parent patent number when a filing continues an already-granted family. Newest filings first. Source: USPTO Open Data Portal (public).

TitleFiledApplication #StatusGranted Parent
CONDUCTIVE OXIDE OVERHANG STRUCTURES FOR OLED DEVICES2026-02-1219538302Docketed New Case - Ready for Examinationparent 12581825
PLENUM DRIVEN HYDROXYL COMBUSTION OXIDATION2026-01-2619459677Docketed New Case - Ready for Examinationparent 12559841
SYMMETRIC PLASMA PROCESS CHAMBER2026-01-2219457138Docketed New Case - Ready for Examinationparent 12555748
PASSIVE LIFT PIN ASSEMBLY2026-01-2219455976Docketed New Case - Ready for Examinationparent 12548743
GATE ALL AROUND BACKSIDE POWER RAIL FORMATION WITH MULTI-COLOR BACKSIDE DIELECTRIC ISOLATION SCHEME2026-01-2019453450Docketed New Case - Ready for Examinationparent 12557636
SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE2026-01-2019454300Docketed New Case - Ready for Examinationparent 12553124
CARRIER WITH ROTATION PREVENTION FEATURE2026-01-1619451967Docketed New Case - Ready for Examinationparent 12528207
PROCESS CHAMBER QUALIFICATION FOR MAINTENANCE PROCESS ENDPOINT DETECTION2026-01-1619452109Docketed New Case - Ready for Examinationparent 12530022
SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-DOPED BORON FILMS2026-01-1419448947Docketed New Case - Ready for Examinationparent 12550651
BATCH PROCESSING CHAMBERS FOR PLASMA-ENHANCED DEPOSITION2026-01-0919444411Docketed New Case - Ready for Examinationparent 12542256
DIRECT WORD LINE CONTACT AND METHODS OF MANUFACTURE FOR 3D MEMORY2026-01-0819443725Docketed New Case - Ready for Examinationparent 12550317
SUBSTRATE SUPPORT ASSEMBLY WITH MULTIPLE DISCS2026-01-0719442627Docketed New Case - Ready for Examinationparent 12583211
INTEGRATED WET CLEAN FOR EPITAXIAL GROWTH2026-01-0619441427Docketed New Case - Ready for Examinationparent 12538737
Integrated Process Sequence for Hybrid Bonding Applications2026-01-0519439846Docketed New Case - Ready for Examinationparent 12538855
CONFINED CHARGE TRAP LAYER2026-01-0219438814Docketed New Case - Ready for Examinationparent 12538490
FORMATION OF ANGLED GRATINGS2025-12-3119437810Docketed New Case - Ready for Examinationparent 11380578
REDUCED STRAIN Si/SiGe HETEROEPITAXY STACKS FOR 3D DRAM2025-12-3119438155Docketed New Case - Ready for Examinationparent 12526971
SUSTAINABILITY MONITORING PLATFORM WITH SENSOR SUPPORT2025-12-3019437230Docketed New Case - Ready for Examinationparent 12535799
ELECTROSTATIC CHUCK ASSEMBLY FOR HIGH TEMPERATURE PROCESSES2025-12-2419432839Docketed New Case - Ready for Examinationparent 10872800
METHOD AND APPARATUS TO REDUCE FEATURE CHARGING IN PLASMA PROCESSING CHAMBER2025-12-2319431900Docketed New Case - Ready for Examinationparent 12525433
DENSE VERTICALLY SEGMENTED SILICON COATING FOR LOW DEFECTIVITY IN HIGH-TEMPERATURE RAPID THERMAL PROCESSING2025-12-2219429535Docketed New Case - Ready for Examination
HIGH BANDWIDTH DENSITY OPTICAL INTERFACES FOR CO-PACKAGED DEVICES INCLUDING PHOTONIC INTEGRATED CIRCUITS2025-12-1919426855Docketed New Case - Ready for Examinationparent 12523828
INTEGRATED CLEAN AND DRY MODULE FOR CLEANING A SUBSTRATE2025-12-1919426249Docketed New Case - Ready for Examinationparent 12525468
LARGE AREA GAPFILL USING VOLUMETRIC EXPANSION2025-12-1719422811Docketed New Case - Ready for Examinationparent 12525446
INPUT/OUTPUT (IO) HANDLING DURING UPDATE PROCESS FOR MANUFACTURING SYSTEM CONTROLLER2025-12-0819411858Docketed New Case - Ready for Examinationparent 12493273
IN-SITU REFLECTOMETRY FOR REAL-TIME PROCESS CONTROL2025-12-0819412366Docketed New Case - Ready for Examinationparent 12492890
PREVENTION OF CONTAMINATION OF SUBSTRATES DURING PRESSURE CHANGES IN PROCESSING SYSTEMS2025-12-0419409426Docketed New Case - Ready for Examinationparent 12523380
WAVEGUIDE FOR DISPLAY PANEL2025-12-0119489218Sent to Classification contractor
GATE-ALL-AROUND TRANSISTORS AND METHODS OF FORMING2025-12-0119404588Docketed New Case - Ready for Examinationparent 12538509
PHOTONIC GLASS LAYER SUBSTRATE WITH EMBEDDED OPTICAL STRUCTURES FOR COMMUNICATING WITH AN ELECTRO OPTICAL INTEGRATED CIRCUIT2025-12-0119405101Docketed New Case - Ready for Examinationparent 12487417
METHOD OF FABRICATING AN OPTICAL STRUCTURE2025-12-0119489172Sent to Classification contractor
POSITIVE TONE METAL OXIDE RESIST DEVELOPMENT2025-11-2619402466Docketed New Case - Ready for Examination
UNDERLAYER WITH ENTRAPPED EXTREME ULTRAVIOLET (EUV) ABSORPTION ELEMENT2025-11-2619402422Docketed New Case - Ready for Examination
INTEGRATED WET CLEAN FOR BEVEL TREATMENTS2025-11-2419399518Docketed New Case - Ready for Examinationparent 12480215
BARRIER AND LINER FOR INTERCONNECTS2025-11-21PCTUS2025056554RO PROCESSING COMPLETED-PLACED IN STORAGE
METHOD FOR FORMING SLANTED DEVICE STRUCTURES USING BLAZED STRUCTURE TEMPLATE2025-11-20PCTUS2025056455RO PROCESSING COMPLETED-PLACED IN STORAGE
PRINTED MICROWAVE RESONATOR FOR MEASURING HIGH ELECTRON DENSITY PLASMAS2025-11-1919394661Docketed New Case - Ready for Examinationparent 12482641
OPHTHALMIC LENS ARRAYS FOR WAFER-LEVEL ASSEMBLY2025-11-12PCTUS2025055200RO PROCESSING COMPLETED-PLACED IN STORAGE
CONTROLLING FLUORINE DIFFUSION IN PECVD SILICON NITRIDE PROCESS2025-11-12PCTUS2025055186RO PROCESSING COMPLETED-PLACED IN STORAGE
COUPLER FOR A SLIT VALVE GATE HAVING A ROTATABLE JOINT2025-11-12PCTUS2025055194RO PROCESSING COMPLETED-PLACED IN STORAGE
PROCESS CHAMBER IMPROVEMENT2025-11-11PCTUS2025054982RO PROCESSING COMPLETED-PLACED IN STORAGE
FLUID FLOW CONTROL FOR SUBSTRATE PROCESSING CHAMBERS2025-11-11PCTUS2025054967RO PROCESSING COMPLETED-PLACED IN STORAGE
SYSTEMS AND METHODS FOR DEPOSITION RESIDUE CONTROL2025-11-1019384731Docketed New Case - Ready for Examinationparent 12488981
IMPROVED SUBSTRATE SUPPORT FOR PROCESS CHAMBER2025-11-10PCTUS2025054808RO PROCESSING COMPLETED-PLACED IN STORAGE
AIRGAP STRUCTURES FOR IMPROVED EYEPIECE EFFICIENCY2025-11-1019384744Docketed New Case - Ready for Examinationparent 12493138
DETACHABLE LIGHT ENGINE FOR OPTICAL DEVICES2025-11-07PCTUS2025054586RO PROCESSING COMPLETED-PLACED IN STORAGE
FAST SCANNING ACOUSTIC MICROSCOPY FOR SUBSURFACE IMAGING AND INSPECTION2025-11-07PCTUS2025054661RO PROCESSING COMPLETED-PLACED IN STORAGE
CYCLIC DEPOSITION OF SILICON NITRIDE BASED DIELECTRIC FILMS2025-11-07PCTUS2025054526RO PROCESSING COMPLETED-PLACED IN STORAGE
VAPOR CONCENTRATION SENSORS FOR PROCESS CHAMBERS2025-11-0719383447Docketed New Case - Ready for Examinationparent 12503766
PECVD HBN FILM ENGINEERING FOR INTER METAL DIELECTRIC IN 3D SEMICONDUCTOR DEVICES2025-11-06PCTUS2025054309RO PROCESSING COMPLETED-PLACED IN STORAGE

How to read this

Every row here is an application — a request the USPTO has not yet decided. In plain English: these filings show where Applied Materials, Inc.’s R&D effort is pointed right now, often 18–24 months before any product ships — but an application can be amended, abandoned, or rejected, and most confer no enforceable rights until granted. A “granted parent” tag means the filing continues a patent family that already has a grant — the new claims themselves are still pending. Filings are matched by applicant name, so work filed under subsidiary or research-entity names may not appear. Source: USPTO Open Data Portal (public).

Questions this page answers

How many patent applications does Applied Materials, Inc. have on file?

Oxford Ledge tracks 50 U.S. patent applications for Applied Materials, Inc., of which 33 continue an already-granted patent family. Every row is an application (a pending request to the USPTO), not a granted patent.

What is the difference between a patent application and a granted patent?

A patent application is a pending request filed with the USPTO; a granted patent is one the USPTO has examined and issued. These pages track applications, which signal a company's R&D direction before any patent is granted.

Where does this patent data come from?

The USPTO Open Data Portal (public), matched to the company's applicant registrations.