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AMAT · USPTO Filings

Applied Materials, Inc. — Patent Applications


Recent USPTO patent applications filed under applicant “Applied Materials, Inc. / APPLIED MATERIALS, INC.” — pending requests, not granted patents. Where a filing continues an already-granted parent, the parent’s number is shown.

50
Tracked Applications
33
Continuations of Granted Parents

Recent Applications

Every row is a patent application — a pending request, not a granted patent. “Granted Parent” shows the parent patent number when a filing continues an already-granted family. Newest filings first. Source: USPTO Open Data Portal (public).

TitleFiledApplication #StatusGranted Parent
CONDUCTIVE OXIDE OVERHANG STRUCTURES FOR OLED DEVICES2026-02-1219538302Docketed New Case - Ready for Examinationparent 12581825
PLENUM DRIVEN HYDROXYL COMBUSTION OXIDATION2026-01-2619459677Docketed New Case - Ready for Examinationparent 12559841
SYMMETRIC PLASMA PROCESS CHAMBER2026-01-2219457138Docketed New Case - Ready for Examinationparent 12555748
PASSIVE LIFT PIN ASSEMBLY2026-01-2219455976Docketed New Case - Ready for Examinationparent 12548743
GATE ALL AROUND BACKSIDE POWER RAIL FORMATION WITH MULTI-COLOR BACKSIDE DIELECTRIC ISOLATION SCHEME2026-01-2019453450Docketed New Case - Ready for Examinationparent 12557636
SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE2026-01-2019454300Docketed New Case - Ready for Examinationparent 12553124
CARRIER WITH ROTATION PREVENTION FEATURE2026-01-1619451967Docketed New Case - Ready for Examinationparent 12528207
PROCESS CHAMBER QUALIFICATION FOR MAINTENANCE PROCESS ENDPOINT DETECTION2026-01-1619452109Docketed New Case - Ready for Examinationparent 12530022
SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-DOPED BORON FILMS2026-01-1419448947Docketed New Case - Ready for Examinationparent 12550651
BATCH PROCESSING CHAMBERS FOR PLASMA-ENHANCED DEPOSITION2026-01-0919444411Docketed New Case - Ready for Examinationparent 12542256
DIRECT WORD LINE CONTACT AND METHODS OF MANUFACTURE FOR 3D MEMORY2026-01-0819443725Docketed New Case - Ready for Examinationparent 12550317
SUBSTRATE SUPPORT ASSEMBLY WITH MULTIPLE DISCS2026-01-0719442627Docketed New Case - Ready for Examinationparent 12583211
INTEGRATED WET CLEAN FOR EPITAXIAL GROWTH2026-01-0619441427Docketed New Case - Ready for Examinationparent 12538737
Integrated Process Sequence for Hybrid Bonding Applications2026-01-0519439846Docketed New Case - Ready for Examinationparent 12538855
CONFINED CHARGE TRAP LAYER2026-01-0219438814Docketed New Case - Ready for Examinationparent 12538490
FORMATION OF ANGLED GRATINGS2025-12-3119437810Docketed New Case - Ready for Examinationparent 11380578
REDUCED STRAIN Si/SiGe HETEROEPITAXY STACKS FOR 3D DRAM2025-12-3119438155Docketed New Case - Ready for Examinationparent 12526971
SUSTAINABILITY MONITORING PLATFORM WITH SENSOR SUPPORT2025-12-3019437230Docketed New Case - Ready for Examinationparent 12535799
ELECTROSTATIC CHUCK ASSEMBLY FOR HIGH TEMPERATURE PROCESSES2025-12-2419432839Docketed New Case - Ready for Examinationparent 10872800
METHOD AND APPARATUS TO REDUCE FEATURE CHARGING IN PLASMA PROCESSING CHAMBER2025-12-2319431900Docketed New Case - Ready for Examinationparent 12525433
DENSE VERTICALLY SEGMENTED SILICON COATING FOR LOW DEFECTIVITY IN HIGH-TEMPERATURE RAPID THERMAL PROCESSING2025-12-2219429535Docketed New Case - Ready for Examination
HIGH BANDWIDTH DENSITY OPTICAL INTERFACES FOR CO-PACKAGED DEVICES INCLUDING PHOTONIC INTEGRATED CIRCUITS2025-12-1919426855Docketed New Case - Ready for Examinationparent 12523828
INTEGRATED CLEAN AND DRY MODULE FOR CLEANING A SUBSTRATE2025-12-1919426249Docketed New Case - Ready for Examinationparent 12525468
LARGE AREA GAPFILL USING VOLUMETRIC EXPANSION2025-12-1719422811Docketed New Case - Ready for Examinationparent 12525446
INPUT/OUTPUT (IO) HANDLING DURING UPDATE PROCESS FOR MANUFACTURING SYSTEM CONTROLLER2025-12-0819411858Docketed New Case - Ready for Examinationparent 12493273
IN-SITU REFLECTOMETRY FOR REAL-TIME PROCESS CONTROL2025-12-0819412366Docketed New Case - Ready for Examinationparent 12492890
PREVENTION OF CONTAMINATION OF SUBSTRATES DURING PRESSURE CHANGES IN PROCESSING SYSTEMS2025-12-0419409426Docketed New Case - Ready for Examinationparent 12523380
WAVEGUIDE FOR DISPLAY PANEL2025-12-0119489218Sent to Classification contractor
GATE-ALL-AROUND TRANSISTORS AND METHODS OF FORMING2025-12-0119404588Docketed New Case - Ready for Examinationparent 12538509
PHOTONIC GLASS LAYER SUBSTRATE WITH EMBEDDED OPTICAL STRUCTURES FOR COMMUNICATING WITH AN ELECTRO OPTICAL INTEGRATED CIRCUIT2025-12-0119405101Docketed New Case - Ready for Examinationparent 12487417
METHOD OF FABRICATING AN OPTICAL STRUCTURE2025-12-0119489172Sent to Classification contractor
POSITIVE TONE METAL OXIDE RESIST DEVELOPMENT2025-11-2619402466Docketed New Case - Ready for Examination
UNDERLAYER WITH ENTRAPPED EXTREME ULTRAVIOLET (EUV) ABSORPTION ELEMENT2025-11-2619402422Docketed New Case - Ready for Examination
INTEGRATED WET CLEAN FOR BEVEL TREATMENTS2025-11-2419399518Docketed New Case - Ready for Examinationparent 12480215
BARRIER AND LINER FOR INTERCONNECTS2025-11-21PCTUS2025056554RO PROCESSING COMPLETED-PLACED IN STORAGE
METHOD FOR FORMING SLANTED DEVICE STRUCTURES USING BLAZED STRUCTURE TEMPLATE2025-11-20PCTUS2025056455RO PROCESSING COMPLETED-PLACED IN STORAGE
PRINTED MICROWAVE RESONATOR FOR MEASURING HIGH ELECTRON DENSITY PLASMAS2025-11-1919394661Docketed New Case - Ready for Examinationparent 12482641
OPHTHALMIC LENS ARRAYS FOR WAFER-LEVEL ASSEMBLY2025-11-12PCTUS2025055200RO PROCESSING COMPLETED-PLACED IN STORAGE
CONTROLLING FLUORINE DIFFUSION IN PECVD SILICON NITRIDE PROCESS2025-11-12PCTUS2025055186RO PROCESSING COMPLETED-PLACED IN STORAGE
COUPLER FOR A SLIT VALVE GATE HAVING A ROTATABLE JOINT2025-11-12PCTUS2025055194RO PROCESSING COMPLETED-PLACED IN STORAGE
PROCESS CHAMBER IMPROVEMENT2025-11-11PCTUS2025054982RO PROCESSING COMPLETED-PLACED IN STORAGE
FLUID FLOW CONTROL FOR SUBSTRATE PROCESSING CHAMBERS2025-11-11PCTUS2025054967RO PROCESSING COMPLETED-PLACED IN STORAGE
SYSTEMS AND METHODS FOR DEPOSITION RESIDUE CONTROL2025-11-1019384731Docketed New Case - Ready for Examinationparent 12488981
IMPROVED SUBSTRATE SUPPORT FOR PROCESS CHAMBER2025-11-10PCTUS2025054808RO PROCESSING COMPLETED-PLACED IN STORAGE
AIRGAP STRUCTURES FOR IMPROVED EYEPIECE EFFICIENCY2025-11-1019384744Docketed New Case - Ready for Examinationparent 12493138
DETACHABLE LIGHT ENGINE FOR OPTICAL DEVICES2025-11-07PCTUS2025054586RO PROCESSING COMPLETED-PLACED IN STORAGE
FAST SCANNING ACOUSTIC MICROSCOPY FOR SUBSURFACE IMAGING AND INSPECTION2025-11-07PCTUS2025054661RO PROCESSING COMPLETED-PLACED IN STORAGE
CYCLIC DEPOSITION OF SILICON NITRIDE BASED DIELECTRIC FILMS2025-11-07PCTUS2025054526RO PROCESSING COMPLETED-PLACED IN STORAGE
VAPOR CONCENTRATION SENSORS FOR PROCESS CHAMBERS2025-11-0719383447Docketed New Case - Ready for Examinationparent 12503766
PECVD HBN FILM ENGINEERING FOR INTER METAL DIELECTRIC IN 3D SEMICONDUCTOR DEVICES2025-11-06PCTUS2025054309RO PROCESSING COMPLETED-PLACED IN STORAGE

How to read this

Every row here is an application — a request the USPTO has not yet decided. In plain English: these filings show where Applied Materials, Inc.’s R&D effort is pointed right now, often 18–24 months before any product ships — but an application can be amended, abandoned, or rejected, and most confer no enforceable rights until granted. A “granted parent” tag means the filing continues a patent family that already has a grant — the new claims themselves are still pending. Filings are matched by applicant name, so work filed under subsidiary or research-entity names may not appear. Source: USPTO Open Data Portal (public).